Pore sealing mechanism in OSG low‐k films under ion bombardment by Voronina, Ekaterina N., Sycheva, Anastasia A., Lopaev, Dmitry V., Rakhimova, Tatyana V., Rakhimov, Alexander T., Proshina, Olga V., Voloshin, Dmitry G., Zyryanov, Sergey M., Zotovich, Alexey I., Mankelevich, Yuri A.

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Synergistic effect of VUV photons and F atoms on damage and etching of porous organosilicate films by Lopaev, Dmitry V., Zyryanov, Sergey M., Zotovich, Alexey I., Rakhimova, Tatyana V., Mankelevich, Yury A., Rakhimov, Alexander T., Baklanov, Mikhail R.

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Experimental and DFT study of nitrogen atoms interactions with SiOCH low-κ films by Voronina, Ekaterina N., Mankelevich, Yuri A., Rakhimova, Tatyana V., Palov, Alexander P., Lopaev, Dmitry V., Zyryanov, Sergey M., Zotovich, Alexey I., Baklanov, Mikhail R.

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Modification of Porous Ultralow‑k Film by Vacuum Ultraviolet Emission by Zotovich, Alexey I., Zyryanov, Sergey M., Lopaev, Dmitry V., Rezvanov, Askar A., Attallah, Ahmed G., Liedke, Maciej O., Butterling, Maik, Bogdanova, Maria A., Vishnevskiy, Alexey S., Seregin, Dmitry S., Vorotyntsev, Dmitry A., Palov, Alexander P., Hirschmann, Eric, Wagner, Andreas, Naumov, Sergej, Vorotilov, Konstantin A., Rakhimova, Tatyana V., Rakhimov, Alexander T., Baklanov, Mikhail R.

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Improved Plasma Resistance for Porous Low-k Dielectrics by Pore Stuffing Approach by Zhang, Liping, de Marneffe, Jean-Francois, Heyne, Markus H., Naumov, Sergej, Sun, Yiting, Zotovich, Alexey, el Otell, Ziad, Vajda, Felim, De Gendt, Stefan, Baklanov, Mikhail R.

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