Search Results - van der Wagt, H.J.

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    Post-deposition thermal annealing studies of hydrogenated microcrystalline silicon deposited at 40 °C

    Post-deposition thermal annealing studies of hydrogenated microcrystalline silicon deposited at 40 °C by Bronsveld, P.C.P., van der Wagt, H.J., Rath, J.K., Schropp, R.E.I., Beyer, W.

    Published in Thin solid films
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