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Photoelectric Characteristics of Isotype Heterostructure p‑WSe2/p-Si Photodetector with Improved Photoresponsivity and Detectivity

A heterojunction photodetector was fabricated for the first time via chemical vapor deposition by combining a p-type WSe2 monolayered triangular flake with a p-type Si substrate. Under illumination, the p–p isotype heterojunction exhibited a broad photoresponse range of 400–1550 nm under LED and las...

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Bibliographic Details
Published in:ACS applied electronic materials 2023-09, Vol.5 (9), p.4778-4785
Main Authors: Singiri, Ramu, Shin, Dong Won, Jo, Beomsu, Bathalavaram, Poornaprakash, Lee, Moonsang, Hahm, Myung Gwan, Kim, Young Lae
Format: Article
Language:English
Online Access:Get full text
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Summary:A heterojunction photodetector was fabricated for the first time via chemical vapor deposition by combining a p-type WSe2 monolayered triangular flake with a p-type Si substrate. Under illumination, the p–p isotype heterojunction exhibited a broad photoresponse range of 400–1550 nm under LED and laser light. The introduction of monotriangular and atomic thick p-WSe2 flakes onto p-type Si greatly increased the photodetection capability with a long carrier lifetime and robust light absorption. The best performance of this device exhibited a minimized dark current of 5 nA, a record high photocurrent-to-dark-current ratio of ∼28111.88, an ultrahigh detectivity of 2.075 × 1015 jones, a high external quantum efficiency (EQE) of 133132%, and a high responsivity of 568.6 A/W under light illumination of 532 nm with 9.17 mW/cm2 intensity. These engrossing results indicate that this p-WSe2/p-Si heterojunction device has considerable potential for applications in next-generation photodetectors.
ISSN:2637-6113
2637-6113
DOI:10.1021/acsaelm.3c00521