A novel capacitive micro-accelerometer with grid strip capacitances and sensing gap alterable capacitances

• Published in: Journal of semiconductors 2009 (3), p.72-77
• Main Author: 董林玺 陈金丹 颜海霞 霍卫红 李永杰 孙玲玲
• Format: Article
• Language: Chinese
• Subjects: 地带; 场发射显微镜; 差距; 微加速度计; 深反应离子刻蚀; 电容式; 电网; 遥感
• ISSN: 1674-4926

The comb capacitances fabricated by deep reactive ion etching （RIE） process have high aspect ratio which is usually smaller than 30 ： 1 for the complicated process factors, and the combs are usually not parallel due to the well-known micro-loading effect and other process factors, which restricts the increase of the seismic mass by increasing the thickness of comb to reduce the thermal mechanical noise and the decrease of the gap of the comb capacitances for increasing the sensitive capacitance to reduce the electrical noise. Aiming at the disadvantage of the deep RIE, a novel capacitive micro-accelerometer with grid strip capacitances and sensing gap alterable capacitances is developed. One part of sensing of inertial signal of the micro-accelerometer is by the grid strip capacitances whose overlapping area is variable and which do not have the non-parallel plate＇s effect caused by the deep RIE process. Another part is by the sensing gap alterable capacitances whose gap between combs can be reduced by the ac