Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy

Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma （DF-CCP） reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for differe...

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Bibliographic Details
Published in:Plasma science & technology 2011-02, Vol.13 (1), p.61-67
Main Author: 赵国利 徐勇 尚建平 刘文耀 朱爱民 王友年
Format: Article
Language:English
Subjects:
光谱测量
均匀性
容性耦合
氩等离子体
等离子体反应器
非均匀等离子体
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Summary:Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma （DF-CCP） reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low- frequency （LF） power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.
ISSN:1009-0630
DOI:10.1088/1009-0630/13/1/13