The growth and properties of an m-plane InN epilayer on LiAlO2 （100） by metal-organic chemical vapor deposition

The m-plane InN （1 100） epilayers have been grown on a LiAlO2 （1 0 0） substrate by a two-step growth method using a met- al-organic chemical vapor deposition （MOCVD） system. The low temperature InN buffer layer （LT-InN） is introduced to overcome the drawbacks of thermal instability of LiAlO2 （LAO） a...

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Bibliographic Details
Published in:中国科学：物理学、力学、天文学英文版 2012, Vol.55 (7), p.1249-1252
Main Author: XIE ZiLi ZHANG Rong FU DeYi LIU Bin XIU XiangQian HUA XueMei ZHAO Hong CHEN Peng HAN Ping SHI Yi ZHENG YouDou
Format: Article
Language:English
Subjects:
InN
X射线衍射
化学气相沉积
原子力显微镜
晶体性能
有机金属
生长方法
铝酸锂
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Summary:The m-plane InN （1 100） epilayers have been grown on a LiAlO2 （1 0 0） substrate by a two-step growth method using a met- al-organic chemical vapor deposition （MOCVD） system. The low temperature InN buffer layer （LT-InN） is introduced to overcome the drawbacks of thermal instability of LiAlO2 （LAO） and to relieve the strains due to a large thermal mismatch be- tween LAO and InN. Then the high temperature m-plane InN （1 1 00） epilayers （HT-InN） were grown. The results of X-ray diffraction （XRD） suggest that the m-plane InN （1 1 00） epilayer is a single crystal. The X-ray rocking curves （co scans） （XRC） and atomic force microscopy （AFM） indicate that the m-plane InN （1 1 00） epilayer has anisotropic crystallographic properties. The PL studies of the materials reveal a remarkable energy band gap structure around 0.70 eV at 15 K.
ISSN:1674-7348
1869-1927