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Charge deposition model for investigating SE-microdose effect in trench power MOSFETs
It was demonstrated that heavy ions can induce large current-voltage (I-V) characteristics shift in commercial trench power MOSFETs, named single event microdose effect (SE-microdose effect). A model is pre- sented to describe this effect. This model calculates the charge deposition by a single heav...
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Published in: | Journal of semiconductors 2015-05, Vol.36 (5), p.31-36 |
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Main Author: | |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | It was demonstrated that heavy ions can induce large current-voltage (I-V) characteristics shift in commercial trench power MOSFETs, named single event microdose effect (SE-microdose effect). A model is pre- sented to describe this effect. This model calculates the charge deposition by a single heavy ion hitting oxide and the subsequent charge transport under an electric field. Holes deposited at the SiO2/Si interface by a Xe ion are calculated by using this model. The calculated results were then used in Sentaurus TCAD software to simulate a trench power MOSFET's I-V curve shift after a Xe ion has hit it. The simulation results are consistent with the related experiment's data. In the end, several factors which affect the SE-microdose effect in trench power MOSFETs are investigated by using this model. |
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ISSN: | 1674-4926 |
DOI: | 10.1088/1674-4926/36/5/054003 |