Broadband Optical Antireflection Enhancement by Integrating Antireflective Nanoislands with Silicon Nanoconical-Frustum Arrays

Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded‐index nanostructures for broadband optical antireflection enhancement including the near‐ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2011-12, Vol.23 (48), p.5796-5800
Main Authors: Park, Haesung, Shin, Dongheok, Kang, Gumin, Baek, Seunghwa, Kim, Kyoungsik, Padilla, Willie J.
Format: Article
Language:English
Subjects:
Equipment Design
Light
lithography
Materials Testing
metamaterials
Microscopy, Electron, Scanning - methods
nanostructures
Nanostructures - chemistry
Nanotechnology - methods
Optics and Photonics
photonic crystals
Photons
self-assembly
Silicon - chemistry
Solar Energy
Sunlight
Surface Properties
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Summary:Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded‐index nanostructures for broadband optical antireflection enhancement including the near‐ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano‐conical‐frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter‐wavelength AR coating and biomimetic moth's eye structure.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201103399