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Photon Sieving: Selective and Sensitive Photon Sieve Based on III–V Semiconductor Nanowire Forest Fabricated by Lithography‐Free Process (Advanced Optical Materials 17/2020)

In article number 2000198, Young Min Song and co‐workers report the theoretical and experimental demonstrations of a selective and sensitive photon sieve based on III–V semiconductor nanowire forests. The nanoscopic photonic phenomena of nanowire forests, which have been barely studied, are importan...

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Bibliographic Details
Published in:Advanced optical materials 2020-09, Vol.8 (17), p.n/a
Main Authors: Lee, Gil Ju, Park, Kwangwook, Kim, Min Seok, Chang, Sehui, Seok, Tae Joon, Park, Hong‐Gyu, Ju, Gunwu, Kim, Kyujung, Song, Young Min
Format: Article
Language:English
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Summary:In article number 2000198, Young Min Song and co‐workers report the theoretical and experimental demonstrations of a selective and sensitive photon sieve based on III–V semiconductor nanowire forests. The nanoscopic photonic phenomena of nanowire forests, which have been barely studied, are important for various applications such as physically unclonable functions and retinal prostheses. The cover image depicts the photon sieving effect by the implemented III–V nanowire‐based photon sieve.
ISSN:2195-1071
2195-1071
DOI:10.1002/adom.202070070