Cover Picture: High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies (Angew. Chem. Int. Ed. 43/2004)

High‐performance imprint lithographic applications are ideally suited for perfluoropolyether‐based elastomers. The cover picture shows sub‐100‐nm sized features replicated by these materials whose successful application comes from their remarkably low surface energy and their high flexibility. The p...

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Bibliographic Details
Published in:Angewandte Chemie International Edition 2004-11, Vol.43 (43), p.5709-5709
Main Authors: Rolland, Jason P., Hagberg, Erik C., Denison, Ginger M., Carter, Kenneth R., De Simone, Joseph M.
Format: Article
Language:English
Subjects:
fluorine
imprinting
lithography
nanostructures
polymers
Citations: Items that cite this one
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Summary:High‐performance imprint lithographic applications are ideally suited for perfluoropolyether‐based elastomers. The cover picture shows sub‐100‐nm sized features replicated by these materials whose successful application comes from their remarkably low surface energy and their high flexibility. The performance of the materials suggests that replication at even smaller sizes may be possible. For more information, see the Communication by J. M. De Simone, K. R. Carter, and co‐workers on page 5796 ff.
ISSN:1433-7851
1521-3773
DOI:10.1002/anie.200490149