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Effect of nano silicon dioxide on the structure and properties of FeCl 3 ‐doped polyvinyl alcohol photopolymer film
The polyvinyl alcohol (PVA) photopolymer films (PFs) were prepared based on iron(III) trichloride as the photosensitizer and PVA as the polymer matrix (Fe(III)‐PVA). The nano silicon dioxide (nano‐SiO 2 ) was mixed with the resin in proportions of 0.5, 1.0, 2.0, and 5.0 wt %, respectively. The iodin...
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Published in: | Journal of applied polymer science 2019-07, Vol.136 (26) |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The polyvinyl alcohol (PVA) photopolymer films (PFs) were prepared based on iron(III) trichloride as the photosensitizer and PVA as the polymer matrix (Fe(III)‐PVA). The nano silicon dioxide (nano‐SiO
2
) was mixed with the resin in proportions of 0.5, 1.0, 2.0, and 5.0 wt %, respectively. The iodine gallium lamp (350–450 nm) was used as a UV curing light source. The effects of nano‐SiO
2
on the structures and properties of Fe(III)‐PVA PFs were studied by scanning electron microscopy(SEM) analysis, ultraviolet–visible absorption spectroscopy(UV/Vis), X‐ray diffraction (XRD), dynamic thermomechanical analysis(DMA), gel content test, tensile strength test, and Shore hardness test. The Fe(III)‐PVA PFs with the content of 1.0 wt %‐nano‐SiO
2
exhibits the highest gel content and tensile strength. The Fe(III)‐PVA PFs with the content of 2.0 wt % nano‐SiO
2
exhibits the highest Shore hardness. Photolithographic patterning of the Fe(III)‐PVA PFs using a UV source has been carried out, which leads to a good contrast behavior after development in an aqueous media when the content of nano‐SiO
2
was lower than 2.0 wt %. After evaluating the structure, performance, and development results, the Fe(III)‐PVA PFs with the content of 1.0 wt % nano‐SiO
2
exhibits the best overall properties. © 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci.
2019
,
136
, 47702. |
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ISSN: | 0021-8995 1097-4628 |
DOI: | 10.1002/app.47702 |