Chemical vapor deposition: Thermal and plasma deposition of electronic materials. By S. Sivaram, Van Nostrand Reinhold, New York 1995, ix, 292 pp., hardcover, $49.00, ISBN 0-442-01079-6

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Bibliographic Details
Published in:Chemical Vapor Deposition 1996, Vol.2 (5), p.210-210
Main Author: Hammond, Mark S.
Format: Review
Language:English
Online Access:Get full text
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ISSN:0948-1907
1521-3862
DOI:10.1002/cvde.19960020511