An In Situ Copper Plated Boron-Doped Diamond Microelectrode Array for the Sensitive Electrochemical Detection of Nitrate

The first example of using a copper microelectrode array for use in electroanalysis is explored and exemplified with the electroanalytical quantification of nitrate. The analytical approach is based upon the in situ deposition of copper at a boron‐doped diamond (BDD) microelectrode array. The immobi...

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Bibliographic Details
Published in:Electroanalysis (New York, N.Y.) N.Y.), 2005-10, Vol.17 (20), p.1806-1815
Main Authors: Ward-Jones, Sarah, Banks, Craig E., Simm, Andrew O., Jiang, Li, Compton, Richard G.
Format: Article
Language:English
Subjects:
Boron-doped diamond array
Copper microelectrode array
Copper modification
Electrocatalysis
Nitrate detection
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Summary:The first example of using a copper microelectrode array for use in electroanalysis is explored and exemplified with the electroanalytical quantification of nitrate. The analytical approach is based upon the in situ deposition of copper at a boron‐doped diamond (BDD) microelectrode array. The immobilized copper layer is electrocatalytic for nitrate reduction and exhibits an analytically useful range from 1.2 to 124 μM with a marked selectivity for nitrate ion over nitrate, with a limit of detection of 0.76 μM. The analytical applicability was examined through standard addition determinations of nitrate in drinking and river water samples.
ISSN:1040-0397
1521-4109
DOI:10.1002/elan.200503316