Holographic grating formation in photopolymers-Polymethylmethacrylate

Polymethylmethacrylate has been sensitized to 4880 A light and used as a holographic recording medium. The polymer is sensitized with a material which may itsel be degraded by exposure to ultraviolet light. The new process is, therefore, both self‐developing and fixable without chemical processing....

Full description

Saved in:
Bibliographic Details
Published in:Polymer engineering and science 1971-09, Vol.11 (5), p.421-425
Main Author: Laming, F. P.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Polymethylmethacrylate has been sensitized to 4880 A light and used as a holographic recording medium. The polymer is sensitized with a material which may itsel be degraded by exposure to ultraviolet light. The new process is, therefore, both self‐developing and fixable without chemical processing. Holographic diffraction gratings written into this material have diffracting efficiencies as high as 70 percent. Various parameters such as angular selectivity, film thickness, variation of diffracting efficiency with writing angle etc., have been studied. The spontaneously produced diffracted intensity is so high that efficient interference between first and zero ordes is observed during the writing process.
ISSN:0032-3888
1548-2634
DOI:10.1002/pen.760110512