Synthesis and cationic photopolymerization of new silicon-containing oxetane monomers

• Published in: Journal of polymer science. Part A, Polymer chemistry Polymer chemistry, 2004-03, Vol.42 (6), p.1415-1420
• Main Authors: Sangermano, M., Bongiovanni, R., Malucelli, G., Priola, A., Olbrych, J, Harden, A., Rehnberg, N.
• Format: Article
• Language: English
• Subjects: Applied sciences; cationic photopolymerization; coatings; differential scanning calorimetry (DSC); Exact sciences and technology; oxetane monomers; Physicochemistry of polymers; Polymerization; Polymers and radiations; silicon monomers; surface tension; wettability
• ISSN: 0887-624X; 1099-0518
• DOI: 10.1002/pola.20005

The cationic photopolymerization of oxetane‐based systems containing silicon monomers was investigated. For this purpose, three new silicon‐containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon‐containing monomers were added to a typical oxetane resin, 3,3′‐[oxydi(methylene)]bis(3‐ethyloxetane), in concentrations of 1–5 wt %. They exploited a certain surface tension effect without affecting the rate of polymerization. Enrichment only on the air side was achieved, which induced hydrophobicity in the photocured films, depending on the monomer structure and concentration. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1415–1420, 2004 The cationic photopolymerization of oxetane‐based systems containing silicon monomers was investigated. New silicon‐containing oxetane monomers were synthesized for this purpose. The surface properties of UV‐cured films were greatly modified, depending on the silicon monomer structure and concentration.