Cover Picture: Plasma Process. Polym. 6∕2014

Front Cover: The deposition rate of porous thin films deposited by magnetron sputtering at oblique angles is described assuming two contributions: the incorporation of ballistic atoms and of thermalized, isotropically directed, sputtered atoms. A simple general formula is deduced and experimentally...

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Bibliographic Details
Published in:Plasma processes and polymers 2014-06, Vol.11 (6), p.511-511
Main Authors: Alvarez, Rafael, Garcia-Martin, Jose M., Lopez-Santos, Maria C., Rico, Victor, Ferrer, Francisco J., Cotrino, Jose, Gonzalez-Elipe, Agustin R., Palmero, Alberto
Format: Article
Language:English
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Summary:Front Cover: The deposition rate of porous thin films deposited by magnetron sputtering at oblique angles is described assuming two contributions: the incorporation of ballistic atoms and of thermalized, isotropically directed, sputtered atoms. A simple general formula is deduced and experimentally validated. Further details can be found in the article by Rafael Alvarez et. al. on page 571.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201470022