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Rapid dislocation-related D1-photoluminescence imaging of multicrystalline Si wafers at room temperature
Here we report on a novel method, which allows rapid photoluminescence imaging of band‐to‐band and dislocation‐related radiation, D1, on multicrystalline silicon wafers at room temperature. We demonstrate spatially resolved 5.0 × 5.0 cm2 D1‐images, with a resolution of ∼120 µm, within a total record...
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Published in: | Physica status solidi. A, Applications and materials science Applications and materials science, 2011-04, Vol.208 (4), p.888-892 |
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container_title | Physica status solidi. A, Applications and materials science |
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creator | Schmid, R. P. Mankovics, D. Arguirov, T. Ratzke, M. Mchedlidze, T. Kittler, M. |
description | Here we report on a novel method, which allows rapid photoluminescence imaging of band‐to‐band and dislocation‐related radiation, D1, on multicrystalline silicon wafers at room temperature. We demonstrate spatially resolved 5.0 × 5.0 cm2 D1‐images, with a resolution of ∼120 µm, within a total recording time of 550 ms. The method provides homogeneous illumination over the whole sample area. Comparison with results from a conventional photoluminescence mapping technique demonstrates the potential of this new method for application as an in‐line wafer characterization technique. |
doi_str_mv | 10.1002/pssa.201026269 |
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subjects | Condensed matter: structure, mechanical and thermal properties Defects and impurities in crystals microstructure dislocations Exact sciences and technology imaging Linear defects: dislocations, disclinations photoluminescence Physics silicon Structure of solids and liquids crystallography |
title | Rapid dislocation-related D1-photoluminescence imaging of multicrystalline Si wafers at room temperature |
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