Micro reflectance difference techniques: Optical probes for surface exploration

Micro reflectance difference spectroscopy (µ‐RDS) is a promising tool for the in‐situ and ex‐situ characterization of semiconductors surfaces and interfaces. We discuss and compare two different approaches used to measure µ‐RD spectra. One is based on a charge‐coupled device (CCD) camera, while the...

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Bibliographic Details
Published in:physica status solidi (b) 2012-06, Vol.249 (6), p.1119-1123
Main Authors: Lastras-Martínez, L. F., del Pozo-Zamudio, O., Herrera-Jasso, R., Ulloa-Castillo, N.A., Balderas-Navarro, R.E., Ortega-Gallegos, J., Lastras-Martínez, A.
Format: Article
Language:English
Subjects:
optical instrumentation
optical microscopy
reflectance difference spectroscopy
semiconductors
strain
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Summary:Micro reflectance difference spectroscopy (µ‐RDS) is a promising tool for the in‐situ and ex‐situ characterization of semiconductors surfaces and interfaces. We discuss and compare two different approaches used to measure µ‐RD spectra. One is based on a charge‐coupled device (CCD) camera, while the other uses a laser and a XY translation stage. To show the performance of these systems, we have measured surface optical anisotropies of GaSb(001) sample on which anisotropic strains have been generated by preferential mechanical polishing along [110] and $[1{\bar {1}}0]$ directions. The spectrometers are complementary and the selection of one of them depends on the sample to be investigated and on experimental conditions.
ISSN:0370-1972
1521-3951
DOI:10.1002/pssb.201100738