Loading…

Chemical Vapor Deposition Growth of BN Thin Films Using B 2 H 6 and NH 3

Saved in:
Bibliographic Details
Published in:physica status solidi (b) 2020-02, Vol.257 (2)
Main Authors: Yamada, Hisashi, Inotsume, Sho, Kumagai, Naoto, Yamada, Toshikazu, Shimizu, Mitsuaki
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3
cites cdi_FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3
container_end_page
container_issue 2
container_start_page
container_title physica status solidi (b)
container_volume 257
creator Yamada, Hisashi
Inotsume, Sho
Kumagai, Naoto
Yamada, Toshikazu
Shimizu, Mitsuaki
description
doi_str_mv 10.1002/pssb.201900318
format article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1002_pssb_201900318</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1002_pssb_201900318</sourcerecordid><originalsourceid>FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3</originalsourceid><addsrcrecordid>eNo90D1PwzAUhWELgUQorMz3DyRcfySxRxpog1SVgcIa2YlNjJI4iish_j1UIKajdznDQ8gtxYwisrs5RpMxpAqRU3lGEpozmnKV03OSIC8xpapkl-Qqxg9ELCmnCamr3o6-1QO86Tks8GDnEP3Rhwm2S_g89hAcrPdw6P0EGz-MEV6jn95hDQxqKEBPHexr4Nfkwukh2pu_XZGXzeOhqtPd8_aput-lrRQy5bLlXBfMdFJ1VorOFU5qLsRPFyV2JldGCy0dM8zoVtLctrlVTFjjLOv4imS_r-0SYlysa-bFj3r5aig2J4XmpND8K_BvwDhOeQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Chemical Vapor Deposition Growth of BN Thin Films Using B 2 H 6 and NH 3</title><source>Wiley-Blackwell Read &amp; Publish Collection</source><creator>Yamada, Hisashi ; Inotsume, Sho ; Kumagai, Naoto ; Yamada, Toshikazu ; Shimizu, Mitsuaki</creator><creatorcontrib>Yamada, Hisashi ; Inotsume, Sho ; Kumagai, Naoto ; Yamada, Toshikazu ; Shimizu, Mitsuaki</creatorcontrib><identifier>ISSN: 0370-1972</identifier><identifier>EISSN: 1521-3951</identifier><identifier>DOI: 10.1002/pssb.201900318</identifier><language>eng</language><ispartof>physica status solidi (b), 2020-02, Vol.257 (2)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3</citedby><cites>FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3</cites><orcidid>0000-0001-7850-9964</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Yamada, Hisashi</creatorcontrib><creatorcontrib>Inotsume, Sho</creatorcontrib><creatorcontrib>Kumagai, Naoto</creatorcontrib><creatorcontrib>Yamada, Toshikazu</creatorcontrib><creatorcontrib>Shimizu, Mitsuaki</creatorcontrib><title>Chemical Vapor Deposition Growth of BN Thin Films Using B 2 H 6 and NH 3</title><title>physica status solidi (b)</title><issn>0370-1972</issn><issn>1521-3951</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNo90D1PwzAUhWELgUQorMz3DyRcfySxRxpog1SVgcIa2YlNjJI4iish_j1UIKajdznDQ8gtxYwisrs5RpMxpAqRU3lGEpozmnKV03OSIC8xpapkl-Qqxg9ELCmnCamr3o6-1QO86Tks8GDnEP3Rhwm2S_g89hAcrPdw6P0EGz-MEV6jn95hDQxqKEBPHexr4Nfkwukh2pu_XZGXzeOhqtPd8_aput-lrRQy5bLlXBfMdFJ1VorOFU5qLsRPFyV2JldGCy0dM8zoVtLctrlVTFjjLOv4imS_r-0SYlysa-bFj3r5aig2J4XmpND8K_BvwDhOeQ</recordid><startdate>202002</startdate><enddate>202002</enddate><creator>Yamada, Hisashi</creator><creator>Inotsume, Sho</creator><creator>Kumagai, Naoto</creator><creator>Yamada, Toshikazu</creator><creator>Shimizu, Mitsuaki</creator><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0001-7850-9964</orcidid></search><sort><creationdate>202002</creationdate><title>Chemical Vapor Deposition Growth of BN Thin Films Using B 2 H 6 and NH 3</title><author>Yamada, Hisashi ; Inotsume, Sho ; Kumagai, Naoto ; Yamada, Toshikazu ; Shimizu, Mitsuaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yamada, Hisashi</creatorcontrib><creatorcontrib>Inotsume, Sho</creatorcontrib><creatorcontrib>Kumagai, Naoto</creatorcontrib><creatorcontrib>Yamada, Toshikazu</creatorcontrib><creatorcontrib>Shimizu, Mitsuaki</creatorcontrib><collection>CrossRef</collection><jtitle>physica status solidi (b)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yamada, Hisashi</au><au>Inotsume, Sho</au><au>Kumagai, Naoto</au><au>Yamada, Toshikazu</au><au>Shimizu, Mitsuaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Chemical Vapor Deposition Growth of BN Thin Films Using B 2 H 6 and NH 3</atitle><jtitle>physica status solidi (b)</jtitle><date>2020-02</date><risdate>2020</risdate><volume>257</volume><issue>2</issue><issn>0370-1972</issn><eissn>1521-3951</eissn><doi>10.1002/pssb.201900318</doi><orcidid>https://orcid.org/0000-0001-7850-9964</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 0370-1972
ispartof physica status solidi (b), 2020-02, Vol.257 (2)
issn 0370-1972
1521-3951
language eng
recordid cdi_crossref_primary_10_1002_pssb_201900318
source Wiley-Blackwell Read & Publish Collection
title Chemical Vapor Deposition Growth of BN Thin Films Using B 2 H 6 and NH 3
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T16%3A10%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Chemical%20Vapor%20Deposition%20Growth%20of%20BN%20Thin%20Films%20Using%20B%202%20H%206%20and%20NH%203&rft.jtitle=physica%20status%20solidi%20(b)&rft.au=Yamada,%20Hisashi&rft.date=2020-02&rft.volume=257&rft.issue=2&rft.issn=0370-1972&rft.eissn=1521-3951&rft_id=info:doi/10.1002/pssb.201900318&rft_dat=%3Ccrossref%3E10_1002_pssb_201900318%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c848-38c33a62bd89de84df6f8a344d89670db59ba4a8f2b2bac815ec5e924ebfe2d3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true