71.1: High Throughput and Scalable Spatial Atomic Layer Deposition of Al 2 O 3 as a Moisture Barrier for Flexible OLED Display

We have developed high throughput and scalable space divided atomic layer deposition (ALD) system for thin filmencapsulation (TFE) of flexible OLEDs display. In this paper, we report high moisture barrier properties of Al 2 O 3 films deposited by our new developed high throughput (70 Å/min) spatial...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2015-06, Vol.46 (1), p.1043-1046
Main Authors: Choi, Hagyoung, Shin, Seokyooon, Choi, Yonghyuk, Choi, Yeongtae, Kim, Junghun, Kim, Sanghun, Kim, Hyungkyu, Park, Jongsik, Chung, Seog Chul, Jeon, Hyeongtag, Oh, Kiyoung
Format: Article
Language:English
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Summary:We have developed high throughput and scalable space divided atomic layer deposition (ALD) system for thin filmencapsulation (TFE) of flexible OLEDs display. In this paper, we report high moisture barrier properties of Al 2 O 3 films deposited by our new developed high throughput (70 Å/min) spatial ALD with 2G glass substrate size (370 × 470 mm 2 ). The WVTR on flexible substrate could achieve ∼10 −5 g/m 2 ‐day under tritium test.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.10378