Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review (Small 35/2024)

Chemical Etching The controlled voltage‐assisted chemical etching (ECE) and metal‐assisted chemical etching (MaCE) of silicon at the micro and nano scales represent two sides of the same coin, as illustrated in the cover art. In article number 2400499, Salvatore Surdo and Giuseppe Barillaro provide...

Full description

Saved in:
Bibliographic Details
Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2024-08, Vol.20 (35), p.n/a
Main Authors: Surdo, Salvatore, Barillaro, Giuseppe
Format: Article
Language:English
Subjects:
biosensing
electrochemical etching
medicine
metal‐assisted etching
microstructure
microsystems
nanostructure
photonics
silicon
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Chemical Etching The controlled voltage‐assisted chemical etching (ECE) and metal‐assisted chemical etching (MaCE) of silicon at the micro and nano scales represent two sides of the same coin, as illustrated in the cover art. In article number 2400499, Salvatore Surdo and Giuseppe Barillaro provide a unique understanding of ECE and MaCE technologies, highlighting the most recent advancements and exploring future perspectives in silicon micro and nano machining.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.202470265