Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review (Small 35/2024)

Chemical Etching The controlled voltage‐assisted chemical etching (ECE) and metal‐assisted chemical etching (MaCE) of silicon at the micro and nano scales represent two sides of the same coin, as illustrated in the cover art. In article number 2400499, Salvatore Surdo and Giuseppe Barillaro provide...

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Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2024-08, Vol.20 (35), p.n/a
Main Authors: Surdo, Salvatore, Barillaro, Giuseppe
Format: Article
Language:English
Subjects:
biosensing
electrochemical etching
medicine
metal‐assisted etching
microstructure
microsystems
nanostructure
photonics
silicon
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Barillaro, Giuseppe
description Chemical Etching The controlled voltage‐assisted chemical etching (ECE) and metal‐assisted chemical etching (MaCE) of silicon at the micro and nano scales represent two sides of the same coin, as illustrated in the cover art. In article number 2400499, Salvatore Surdo and Giuseppe Barillaro provide a unique understanding of ECE and MaCE technologies, highlighting the most recent advancements and exploring future perspectives in silicon micro and nano machining.
doi_str_mv 10.1002/smll.202470265
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source Wiley-Blackwell Read & Publish Collection
subjects biosensing
electrochemical etching
medicine
metal‐assisted etching
microstructure
microsystems
nanostructure
photonics
silicon
title Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review (Small 35/2024)
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