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High‐Performance and Industrially Viable Nanostructured SiO x Layers for Interface Passivation in Thin Film Solar Cells

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Bibliographic Details
Published in:Solar RRL 2021-03, Vol.5 (3)
Main Authors: Cunha, José M. V., Oliveira, Kevin, Lontchi, Jackson, Lopes, Tomás S., Curado, Marco A., Barbosa, João R. S., Vinhais, Carlos, Chen, Wei-Chao, Borme, Jérôme, Fonseca, Helder, Gaspar, João, Flandre, Denis, Edoff, Marika, Silva, Ana G., Teixeira, Jennifer P., Fernandes, Paulo A., Salomé, Pedro M. P.
Format: Article
Language:English
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ISSN:2367-198X
2367-198X
DOI:10.1002/solr.202000534