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Semiconducting properties of TiO2 films thermally formed at 400°C

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Bibliographic Details
Published in:Journal of applied electrochemistry 1995-03, Vol.25 (3), p.247-251
Main Authors: CAMARA, O. R, DE PAULI, C. P, VASCHETTO, M. E, RETAMAL, B, AQUIRRE, M. J, ZAGAL, J. H, BIAGGIO, S. R
Format: Article
Language:English
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ISSN:0021-891X
1572-8838
DOI:10.1007/BF00262963