Mechanism of silicon film deposition in the RF plasma reduction of silicon tetrachloride

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Bibliographic Details
Published in:Plasma chemistry and plasma processing 1986-06, Vol.6 (2), p.109-125
Main Authors: BRUNO, G, CAPEZZUTO, P, CICALA, G, CRAMAROSSA, F
Format: Article
Language:English
Subjects:
Chemistry
Exact sciences and technology
Inorganic chemistry and origins of life
Kinetics and mechanism of reactions
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ISSN:0272-4324
1572-8986
DOI:10.1007/bf00571271