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Amorphous to crystalline transition in Dy-Fe thin films
The crystallization of vacuum-deposited amorphous Dy--Fe thin films was studied by transmission electron microscopy and electron diffraction. The effects of thickness, deposition rate and substrate temperature on the crystallization process have been investigated. The results show that the crystalli...
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Published in: | Applied Physics A Solids and Surfaces 1986-08, Vol.40 (4), p.241-245 |
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Main Author: | |
Format: | Article |
Language: | English |
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Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | The crystallization of vacuum-deposited amorphous Dy--Fe thin films was studied by transmission electron microscopy and electron diffraction. The effects of thickness, deposition rate and substrate temperature on the crystallization process have been investigated. The results show that the crystallization thickness d sub c decreases with increasing deposition rate and substrate temperature. The number density of Dy--Fe islands was found to be almost constant at (4-5) x 10 exp 11 cm exp --2 in the thickness range 20 A < d < 50 A. The number density decreases with increase in d sub c . 14 ref.--AA |
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ISSN: | 0721-7250 1432-0630 |
DOI: | 10.1007/BF00616601 |