Examination of the surface of ultradispersed silicon nitride by photoelectron spectroscopy

X-ray photoelectron spectroscopy (XPS) has identified a thin oxynitride layer of ultradispersed particles of Ti-nitrides but the thickness and characteristics of the layers have not been fully studied. This is critical since large surface areas that are inactive can adversely affect the sintering ch...

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Bibliographic Details
Published in:Soviet Powder Metallurgy and Metal Ceramics 1990-03, Vol.29 (3), p.241-244
Main Authors: Vaivads, Ya. K., Miller, T. N., Kuzyukevich, A. A., Bertoti, I., Sekei, T., Lukach, M.
Format: Article
Language:English
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Summary:X-ray photoelectron spectroscopy (XPS) has identified a thin oxynitride layer of ultradispersed particles of Ti-nitrides but the thickness and characteristics of the layers have not been fully studied. This is critical since large surface areas that are inactive can adversely affect the sintering characteristics of the powders. To fully understand the nature of this layer, this present work was undertaken. Analyses were performed by XPS using the plasma chemical method. The specimens were ion etched to obtain depth profiles of oxygen, carbon, silicon, and nitrogen. The data show that the carbon was adsorbed on the surfaces but oxygen was dispersed throughout the volume. Also, detailed analysis of the data shows that Si forms both Si sub 3 N 4 and SiO sub 2 and that oxynitrides and carbonates are present.
ISSN:0038-5735
1573-9066
DOI:10.1007/BF00797971