Loading…
Investigation of Al diffusion in different oxide thin-film layers by SNMS/HFM method
Saved in:
Published in: | Mikrochimica acta (1966) 1997-01, Vol.125 (1-4), p.223-227 |
---|---|
Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13 |
---|---|
cites | cdi_FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13 |
container_end_page | 227 |
container_issue | 1-4 |
container_start_page | 223 |
container_title | Mikrochimica acta (1966) |
container_volume | 125 |
creator | PAULUS, H KORNELY, S GIBER, J MÜLLER, K.-H |
description | |
doi_str_mv | 10.1007/bf01246187 |
format | article |
fullrecord | <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1007_BF01246187</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2577997</sourcerecordid><originalsourceid>FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13</originalsourceid><addsrcrecordid>eNo9kE1PAjEYhBujiYhe_AU9eDJZ6dtuv45IRElAD-B50-2H1Cy7pF2N_HtB1NNkJs_MYRC6BnIHhMhRHQjQUoCSJ2gAJRMFJ5KdogEhVBRMSHqOLnJ-JwSkoOUArWbtp899fDN97FrcBTxusIshfOSDj-2P8cm3Pe6-ovO4X8e2CLHZ4MbsfMq43uHl82I5epou8Mb3685dorNgmuyvfnWIXqcPq8lTMX95nE3G88JSrvrCSCIV1VqHAFwYZZ3VitPgHTHACaPAgnDWSlXzfa6sqpUBDd750pUG2BDdHndt6nJOPlTbFDcm7Sog1eGP6n7698cevjnCW5OtaUIyrY35v0G5lFpL9g0kTl7I</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Investigation of Al diffusion in different oxide thin-film layers by SNMS/HFM method</title><source>Springer Link</source><creator>PAULUS, H ; KORNELY, S ; GIBER, J ; MÜLLER, K.-H</creator><creatorcontrib>PAULUS, H ; KORNELY, S ; GIBER, J ; MÜLLER, K.-H</creatorcontrib><identifier>ISSN: 0026-3672</identifier><identifier>EISSN: 1436-5073</identifier><identifier>DOI: 10.1007/bf01246187</identifier><identifier>CODEN: MIACAQ</identifier><language>eng</language><publisher>Wien: Springer</publisher><subject>Chemical interdiffusion; diffusion barriers ; Condensed matter: structure, mechanical and thermal properties ; Diffusion in solids ; Exact sciences and technology ; Physics ; Transport properties of condensed matter (nonelectronic)</subject><ispartof>Mikrochimica acta (1966), 1997-01, Vol.125 (1-4), p.223-227</ispartof><rights>1997 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13</citedby><cites>FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,777,781,786,787,23911,23912,25121,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2577997$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>PAULUS, H</creatorcontrib><creatorcontrib>KORNELY, S</creatorcontrib><creatorcontrib>GIBER, J</creatorcontrib><creatorcontrib>MÜLLER, K.-H</creatorcontrib><title>Investigation of Al diffusion in different oxide thin-film layers by SNMS/HFM method</title><title>Mikrochimica acta (1966)</title><subject>Chemical interdiffusion; diffusion barriers</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Diffusion in solids</subject><subject>Exact sciences and technology</subject><subject>Physics</subject><subject>Transport properties of condensed matter (nonelectronic)</subject><issn>0026-3672</issn><issn>1436-5073</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNo9kE1PAjEYhBujiYhe_AU9eDJZ6dtuv45IRElAD-B50-2H1Cy7pF2N_HtB1NNkJs_MYRC6BnIHhMhRHQjQUoCSJ2gAJRMFJ5KdogEhVBRMSHqOLnJ-JwSkoOUArWbtp899fDN97FrcBTxusIshfOSDj-2P8cm3Pe6-ovO4X8e2CLHZ4MbsfMq43uHl82I5epou8Mb3685dorNgmuyvfnWIXqcPq8lTMX95nE3G88JSrvrCSCIV1VqHAFwYZZ3VitPgHTHACaPAgnDWSlXzfa6sqpUBDd750pUG2BDdHndt6nJOPlTbFDcm7Sog1eGP6n7698cevjnCW5OtaUIyrY35v0G5lFpL9g0kTl7I</recordid><startdate>19970101</startdate><enddate>19970101</enddate><creator>PAULUS, H</creator><creator>KORNELY, S</creator><creator>GIBER, J</creator><creator>MÜLLER, K.-H</creator><general>Springer</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19970101</creationdate><title>Investigation of Al diffusion in different oxide thin-film layers by SNMS/HFM method</title><author>PAULUS, H ; KORNELY, S ; GIBER, J ; MÜLLER, K.-H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Chemical interdiffusion; diffusion barriers</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Diffusion in solids</topic><topic>Exact sciences and technology</topic><topic>Physics</topic><topic>Transport properties of condensed matter (nonelectronic)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>PAULUS, H</creatorcontrib><creatorcontrib>KORNELY, S</creatorcontrib><creatorcontrib>GIBER, J</creatorcontrib><creatorcontrib>MÜLLER, K.-H</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Mikrochimica acta (1966)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>PAULUS, H</au><au>KORNELY, S</au><au>GIBER, J</au><au>MÜLLER, K.-H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Investigation of Al diffusion in different oxide thin-film layers by SNMS/HFM method</atitle><jtitle>Mikrochimica acta (1966)</jtitle><date>1997-01-01</date><risdate>1997</risdate><volume>125</volume><issue>1-4</issue><spage>223</spage><epage>227</epage><pages>223-227</pages><issn>0026-3672</issn><eissn>1436-5073</eissn><coden>MIACAQ</coden><cop>Wien</cop><cop>New York, NY</cop><pub>Springer</pub><doi>10.1007/bf01246187</doi><tpages>5</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0026-3672 |
ispartof | Mikrochimica acta (1966), 1997-01, Vol.125 (1-4), p.223-227 |
issn | 0026-3672 1436-5073 |
language | eng |
recordid | cdi_crossref_primary_10_1007_BF01246187 |
source | Springer Link |
subjects | Chemical interdiffusion diffusion barriers Condensed matter: structure, mechanical and thermal properties Diffusion in solids Exact sciences and technology Physics Transport properties of condensed matter (nonelectronic) |
title | Investigation of Al diffusion in different oxide thin-film layers by SNMS/HFM method |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T17%3A59%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Investigation%20of%20Al%20diffusion%20in%20different%20oxide%20thin-film%20layers%20by%20SNMS/HFM%20method&rft.jtitle=Mikrochimica%20acta%20(1966)&rft.au=PAULUS,%20H&rft.date=1997-01-01&rft.volume=125&rft.issue=1-4&rft.spage=223&rft.epage=227&rft.pages=223-227&rft.issn=0026-3672&rft.eissn=1436-5073&rft.coden=MIACAQ&rft_id=info:doi/10.1007/bf01246187&rft_dat=%3Cpascalfrancis_cross%3E2577997%3C/pascalfrancis_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c258t-a70782999ff156a8cdc9852fed0a1503213f6dcc78b58528c8b8a191ede4d4a13%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |