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Microstructure of reactively sputtered oxide diffusion barriers

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Published in:Journal of electronic materials 1988-09, Vol.17 (5), p.425-432
Main Authors: Kolawa, E., Nieh, C. W., So, F. C. T., Nicolet, M. -A.
Format: Article
Language:English
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cited_by cdi_FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443
cites cdi_FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443
container_end_page 432
container_issue 5
container_start_page 425
container_title Journal of electronic materials
container_volume 17
creator Kolawa, E.
Nieh, C. W.
So, F. C. T.
Nicolet, M. -A.
description
doi_str_mv 10.1007/BF02652129
format article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1007_BF02652129</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1007_BF02652129</sourcerecordid><originalsourceid>FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443</originalsourceid><addsrcrecordid>eNpFj01LxDAUAIMoWFcv_oKchep7-WpzEl1cFVa8KHgrSfMCkdUuSSruv5dFwdPchhnGzhEuEaC7ul2BMFqgsAesQa1ki715O2QNSIOtFlIfs5NS3gFQY48Nu35KY55KzfNY50x8ijyTG2v6os2Ol-1cK2UKfPpOgXhIMc4lTZ_cu5wT5XLKjqLbFDr744K9ru5elg_t-vn-cXmzbkdhu9p6cgTYhxCFUMarqKN30irQnVCAUQYjvRUeHaqeZHQRO2FAoDRaWaXkgl38eve1JVMctjl9uLwbEIb9-vC_Ln8ALSBLqA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Microstructure of reactively sputtered oxide diffusion barriers</title><source>Springer LINK Archives</source><creator>Kolawa, E. ; Nieh, C. W. ; So, F. C. T. ; Nicolet, M. -A.</creator><creatorcontrib>Kolawa, E. ; Nieh, C. W. ; So, F. C. T. ; Nicolet, M. -A.</creatorcontrib><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/BF02652129</identifier><language>eng</language><ispartof>Journal of electronic materials, 1988-09, Vol.17 (5), p.425-432</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443</citedby><cites>FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kolawa, E.</creatorcontrib><creatorcontrib>Nieh, C. W.</creatorcontrib><creatorcontrib>So, F. C. T.</creatorcontrib><creatorcontrib>Nicolet, M. -A.</creatorcontrib><title>Microstructure of reactively sputtered oxide diffusion barriers</title><title>Journal of electronic materials</title><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1988</creationdate><recordtype>article</recordtype><recordid>eNpFj01LxDAUAIMoWFcv_oKchep7-WpzEl1cFVa8KHgrSfMCkdUuSSruv5dFwdPchhnGzhEuEaC7ul2BMFqgsAesQa1ki715O2QNSIOtFlIfs5NS3gFQY48Nu35KY55KzfNY50x8ijyTG2v6os2Ol-1cK2UKfPpOgXhIMc4lTZ_cu5wT5XLKjqLbFDr744K9ru5elg_t-vn-cXmzbkdhu9p6cgTYhxCFUMarqKN30irQnVCAUQYjvRUeHaqeZHQRO2FAoDRaWaXkgl38eve1JVMctjl9uLwbEIb9-vC_Ln8ALSBLqA</recordid><startdate>198809</startdate><enddate>198809</enddate><creator>Kolawa, E.</creator><creator>Nieh, C. W.</creator><creator>So, F. C. T.</creator><creator>Nicolet, M. -A.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>198809</creationdate><title>Microstructure of reactively sputtered oxide diffusion barriers</title><author>Kolawa, E. ; Nieh, C. W. ; So, F. C. T. ; Nicolet, M. -A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1988</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kolawa, E.</creatorcontrib><creatorcontrib>Nieh, C. W.</creatorcontrib><creatorcontrib>So, F. C. T.</creatorcontrib><creatorcontrib>Nicolet, M. -A.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of electronic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kolawa, E.</au><au>Nieh, C. W.</au><au>So, F. C. T.</au><au>Nicolet, M. -A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Microstructure of reactively sputtered oxide diffusion barriers</atitle><jtitle>Journal of electronic materials</jtitle><date>1988-09</date><risdate>1988</risdate><volume>17</volume><issue>5</issue><spage>425</spage><epage>432</epage><pages>425-432</pages><issn>0361-5235</issn><eissn>1543-186X</eissn><doi>10.1007/BF02652129</doi><tpages>8</tpages></addata></record>
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ispartof Journal of electronic materials, 1988-09, Vol.17 (5), p.425-432
issn 0361-5235
1543-186X
language eng
recordid cdi_crossref_primary_10_1007_BF02652129
source Springer LINK Archives
title Microstructure of reactively sputtered oxide diffusion barriers
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T02%3A55%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Microstructure%20of%20reactively%20sputtered%20oxide%20diffusion%20barriers&rft.jtitle=Journal%20of%20electronic%20materials&rft.au=Kolawa,%20E.&rft.date=1988-09&rft.volume=17&rft.issue=5&rft.spage=425&rft.epage=432&rft.pages=425-432&rft.issn=0361-5235&rft.eissn=1543-186X&rft_id=info:doi/10.1007/BF02652129&rft_dat=%3Ccrossref%3E10_1007_BF02652129%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c297t-beae018ddf2246b4f5fba3940572401f3d63b92b1a148e3faf172602136549443%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true