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Deposition of nanocomposite TiN-Si3N4 thin films by hybrid cathodic arc and chemical vapor process

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2005-06, Vol.81 (1), p.151-158
Main Authors: BENDAVID, A, MARTIN, P. J, CAIRNEY, J, HOFFMAN, M, FISCHER-CRIPPS, A. C
Format: Article
Language:English
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ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-004-2951-0