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Formation of tunnel barrier using a pseudo-atomic layer deposition method and its application to spin-dependent tunneling junction

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2005-08, Vol.81 (3), p.611-615
Main Authors: HAN, S.-H, JEONG, W.-C, LEE, J.-S, KIM, B. D, JOO, S.-K
Format: Article
Language:English
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ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-004-3012-4