Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2005-06, Vol.81 (1), p.71-77
Main Authors: IGNATOVA, V. A, MÖLLER, W, CONARD, T, VANDERVORST, W, GIJBELS, R
Format: Article
Language:English
Subjects:
Atomic, molecular, and ion beam impact and interactions with surfaces
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electron and ion emission by liquids and solids
impact phenomena
Exact sciences and technology
Impact phenomena (including electron spectra and sputtering)
Physics
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ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-005-3239-8