Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination

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Bibliographic Details
Published in:Microsystem technologies 2002-08, Vol.8 (4-5), p.308-313
Main Authors: CHUANG, Y.-J, TSENG, F.-G, LIN, W.-K
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Mechanical engineering. Machine design
Precision engineering, watch making
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ISSN:0946-7076
1432-1858
DOI:10.1007/s00542-002-0176-8