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Device for oxide dots fabrication with copper wire as cathode probe
A device has been fabricated to perform large area local oxidation with copper wire (thickness 7 μm) as cathode probe. Ability of this device was studied, by silicon oxide (SiO 2 ) dots fabrication on silicon (Si) surface and patterning of model microorganism, Mycobacterium smegmatis on the predeter...
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Published in: | Microsystem technologies : sensors, actuators, systems integration actuators, systems integration, 2011-09, Vol.17 (9), p.1459-1462 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A device has been fabricated to perform large area local oxidation with copper wire (thickness 7 μm) as cathode probe. Ability of this device was studied, by silicon oxide (SiO
2
) dots fabrication on silicon (Si) surface and patterning of model microorganism,
Mycobacterium smegmatis
on the predetermined positions (oxide dots) with preferable surface monolayer. Positive patterning of
Mycobacterium smegmatis
attained on the fabricated substrate due to the charge difference between SiO
2
dot and Si surface, which was confirmed by atomic force microscopy and scanning electron microscopy (SEM) analysis. This device shows possibilities of overcoming the inherent limitations of large area local oxidation by AFM. |
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ISSN: | 0946-7076 1432-1858 |
DOI: | 10.1007/s00542-011-1328-5 |