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Device for oxide dots fabrication with copper wire as cathode probe

A device has been fabricated to perform large area local oxidation with copper wire (thickness 7 μm) as cathode probe. Ability of this device was studied, by silicon oxide (SiO 2 ) dots fabrication on silicon (Si) surface and patterning of model microorganism, Mycobacterium smegmatis on the predeter...

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Bibliographic Details
Published in:Microsystem technologies : sensors, actuators, systems integration actuators, systems integration, 2011-09, Vol.17 (9), p.1459-1462
Main Authors: Sathiyaraj, K., Kanivalan, K., Venkatesan, P., Rajendran, K., Kumaran, S.
Format: Article
Language:English
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Summary:A device has been fabricated to perform large area local oxidation with copper wire (thickness 7 μm) as cathode probe. Ability of this device was studied, by silicon oxide (SiO 2 ) dots fabrication on silicon (Si) surface and patterning of model microorganism, Mycobacterium smegmatis on the predetermined positions (oxide dots) with preferable surface monolayer. Positive patterning of Mycobacterium smegmatis attained on the fabricated substrate due to the charge difference between SiO 2 dot and Si surface, which was confirmed by atomic force microscopy and scanning electron microscopy (SEM) analysis. This device shows possibilities of overcoming the inherent limitations of large area local oxidation by AFM.
ISSN:0946-7076
1432-1858
DOI:10.1007/s00542-011-1328-5