Corrosion resistance of Cr–C–W alloys produced by electrodeposition

Cr–C–W coatings were deposited from organo-aqueous solutions containing dimethylformamide by electrolysis. The obtained deposits were studied by the modern physical methods: X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), time-of-flight secondary ion mass spectrometry (SIMS), and in...

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Bibliographic Details
Published in:Journal of solid state electrochemistry 2015-09, Vol.19 (9), p.2545-2553
Main Authors: Kuznetsov, Vitaly V., Pavlov, Leonid N., Vinokurov, Eugene G., Filatova, Elena A., Kudryavtsev, Vladimir N.
Format: Article
Language:English
Subjects:
Analytical Chemistry
Characterization and Evaluation of Materials
Chemistry
Chemistry and Materials Science
Condensed Matter Physics
Electrochemistry
Energy Storage
Original Paper
Physical Chemistry
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Summary:Cr–C–W coatings were deposited from organo-aqueous solutions containing dimethylformamide by electrolysis. The obtained deposits were studied by the modern physical methods: X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), time-of-flight secondary ion mass spectrometry (SIMS), and inductively coupled plasma atomic emission spectroscopy (ICP-AES). The corrosion of Cr–C–W electrolytic deposits was studied in the solutions of sulfuric acid, sodium chloride, and hydrochloric acid. Cr–C–W coatings demonstrated higher corrosion resistance compared with chromium deposits. It was suggested that the decrease of the corrosion rate is caused by the formation of the thin layer enriched with tungsten and its oxides at the surface of the Cr–C–W alloy. This assumption was confirmed by both XPS and SIMS.
ISSN:1432-8488
1433-0768
DOI:10.1007/s10008-015-3007-4