Blue laser lithography for making antireflective submicron structures on silicon

The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup head and consisting of a 405-nm-wavelength blue la...

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Bibliographic Details
Published in:Optical review (Tokyo, Japan) Japan), 2013-03, Vol.20 (2), p.185-188
Main Authors: Tsai, Rung-Ywan, Cheng, Chung-Ta, Yang, Chin-Tien, Chen, Shuen-Chen, Huang, Chun-Chieh, Chen, Shih-Wei, Lu, Wen-Haw
Format: Article
Language:English
Subjects:
Atomic
Lasers
Microwaves
Molecular
Optical and Plasma Physics
Optical Devices
Optics
Photonics
Physics
Physics and Astronomy
Quantum Optics
Regular Paper
RF and Optical Engineering
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Summary:The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup head and consisting of a 405-nm-wavelength blue laser and a 0.85-numerical-aperture objective lens. Si substrates were patterned with submicron column patterns of various periods and aspect ratios by blue laser lithography using a sputtered Ge-Sb-Sn-O layer as a resist. The reflectance of the patterned Si substrate decreased to 3% on average in the 300–1000 nm wavelength range, with a low sensitivity to the angle of incident light. Such patterned substrates showed potential for application in crystalline Si solar cells.
ISSN:1340-6000
1349-9432
DOI:10.1007/s10043-013-0031-4