Etching of As- and P-based III-V semiconductors in a planar inductively coupled BCl3/Ar plasma

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Bibliographic Details
Published in:Journal of electronic materials 2004-04, Vol.33 (4), p.358-363
Main Authors: LEE, J. W, LIM, W. T, BAEK, I. K, YOO, S. R, JEON, M. H, CHO, G. S, PEARTON, S. J
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Surface cleaning, etching, patterning
Surface treatments
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ISSN:0361-5235
1543-186X
DOI:10.1007/s11664-004-0143-5