Impact of gate-on-drain overlap on the electrical characteristics of TFETs: Role of oxide material and drain spacer

• Published in: Pramāṇa 2022-06, Vol.96 (2), Article 93
• Main Authors: Eliwy, Mahmoud, Elgamal, Muhammad, Shaker, Ahmed, Fedawy, Mostafa
• Format: Article
• Language: English
• Subjects: Astronomy; Astrophysics and Astroparticles; Observations and Techniques; Physics; Physics and Astronomy
• ISSN: 0973-7111; 0973-7111
• DOI: 10.1007/s12043-022-02341-y

In the current study, the gate overlap on the drain side was investigated from the prospects of both DC and high-frequency behaviour. The key parameters extracted in this work to determine the main performance parameters are subthreshold swing (SS), ambipolar current ( I amb ) , ON/OFF current ratio and cut-off frequency. Although the gate overlap on the drain decreases the ambipolar current, it has an adverse effect on the high-frequency performance as the gate-to-drain capacitance increases. This behaviour is observed for increasing overlap length for low- k gate oxide. On the other hand, the ambipolar current does not show a considerable decline when using high- k gate oxide. To obtain a low ambipolar current at lower values of equivalent oxide thickness (EOT), we propose a low-k dielectric spacer above the drain side. The low- k spacer not only decreases the gate-to-drain capacitance but also facilitates the suppression of ambipolarity due to overlap. All simulations carried out in this work are done using the Silvaco TCAD device simulator.