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Measurement of optical mirror with a small-aperture interferometer
In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was estab- lished, which could reduce error a...
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Published in: | Frontiers of Optoelectronics (Online) 2012-06, Vol.5 (2), p.218-223 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was estab- lished, which could reduce error accumulation and improve the precision. A 100ram plane mirror was measured with a 50mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0.00382 and 0.00042, respectively. It proved that the model and method are helpful for large optical measurement. |
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ISSN: | 1674-4128 2095-2759 1674-4594 2095-2767 |
DOI: | 10.1007/s12200-012-0233-6 |