Correction: Rapid Thermal Annealing Under O2 Ambient to Recover the Deterioration by Gamma-Ray Irradiation in a-IGZO TFTs

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Published in:Electronic materials letters 2025-01
Main Authors: Park, Minah, Yoo, Jaewook, Lee, Hongseung, Song, Hyeonjun, Kim, Soyeon, Lim, Seongbin, Park, Seohyeon, Jeong, Jo Hak, Kim, Bongjoong, Lee, Kiyoung, Lee, Yoon Kyeung, Heo, Keun, Kwon, Jiseok, Bae, Hagyoul
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container_title Electronic materials letters
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creator Park, Minah
Yoo, Jaewook
Lee, Hongseung
Song, Hyeonjun
Kim, Soyeon
Lim, Seongbin
Park, Seohyeon
Jeong, Jo Hak
Kim, Bongjoong
Lee, Kiyoung
Lee, Yoon Kyeung
Heo, Keun
Kwon, Jiseok
Bae, Hagyoul
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doi_str_mv 10.1007/s13391-024-00536-6
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title Correction: Rapid Thermal Annealing Under O2 Ambient to Recover the Deterioration by Gamma-Ray Irradiation in a-IGZO TFTs
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