Photoacoustic study of vibrational relaxation of no between 173 and 460 K

The photoacoustic method was used to measure vibrational relaxation rates of NO(ν = 1) betweeen 173 and 460 K. A minimum in the V—T transition probability was found near 300 K. Comparison with theory is made in an attempt to explain NO relaxation, i.e. high collisional efficiency and inverse tempera...

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Bibliographic Details
Published in:Chemical physics letters 1982-09, Vol.91 (2), p.135-138
Main Authors: Da Silva, M.Rebelo, Vasconcelos, M.H., Lepoutre, F., Perrin, M.Y.
Format: Article
Language:English
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Summary:The photoacoustic method was used to measure vibrational relaxation rates of NO(ν = 1) betweeen 173 and 460 K. A minimum in the V—T transition probability was found near 300 K. Comparison with theory is made in an attempt to explain NO relaxation, i.e. high collisional efficiency and inverse temperature dependence of the probability at low temperatures.
ISSN:0009-2614
1873-4448
DOI:10.1016/0009-2614(82)80123-1