Quantitative ion implantation: The practice

Quantitative ion implantation is finding increasing application in the preparation of a unique type of reference standard for instrumental analysis, as well as for other tasks in which accurate microgram or submicrogram quantities of a chemical element or one of its isotopes are required. A high-res...

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Bibliographic Details
Published in:International journal of mass spectrometry and ion physics 1979-01, Vol.30 (2), p.113-125
Main Author: Gries, W.H.
Format: Article
Language:English
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Summary:Quantitative ion implantation is finding increasing application in the preparation of a unique type of reference standard for instrumental analysis, as well as for other tasks in which accurate microgram or submicrogram quantities of a chemical element or one of its isotopes are required. A high-resolution electromagnetic isotope separator is used to supply the high-purity ion beam for implantation into the solid host. The implantation itself takes place inside a purpose-designed “implantation camera”. The present paper describes and discusses the practical side of the process, including essential ion beam properties, secondary emission, the design and use of the implantation camera, and its applications.
ISSN:0020-7381
1873-3034
DOI:10.1016/0020-7381(79)80089-3