Characteristics of carbon incorporation in GaAs grown by gas source molecular beam epitaxy

• Published in: Journal of crystal growth 1990-02, Vol.100 (1-2), p.5-10
• Main Authors: Gotoda, Mitsunobu, Maruno, Shigemitsu, Morishita, Yoshitaka, Nomura, Yoshinori, Ogata, Hitoshi, Kuramoto, Kazuo, Kuroki, Hiroshi
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Surface and interface dynamics and vibrations; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/0022-0248(90)90602-H

Nominally undoped p-type GaAs has been grown by gas source molecular beam epitaxy (GSMBE) using triethygallium and arsine. The temperature dependence of carbon incorporation has been investigated. It has been found that there exists an optimum growth temperature (Tg) of about 550 ° C, at which the lowest carbon incorporation and the highest Hall mobility are attained. At Tg higher than 550 ° C with a V/III ratio of 5, the carrier concentration exhibits an Arrhenius type dependence on Tg with an activation energy of 2.2 eV. In contrast, when Tg is lower than 550 ° C, the carrier concentration increases with decreasing Tg. Defect induced bound exciton peaks have been observed in the photoluminescence spectra except for the sample grown at the optimum growth temperature. A qualitative model to explain the characteristics of carbon incorporation will be discussed.