Loading…
Fine-grain tungsten by chemical vapor deposition
A method is described of obtaining fine-grain, non-columnar tungsten (W) by chemical vapor deposition (CVD). Typical CVD tungsten grows columnar grains perpendicular to a heated surface when deposited from its halides, generally WF or WCl 6. The present method involves the partial nitriding of the t...
Saved in:
Published in: | Journal of the less-common metals 1969-01, Vol.18 (3), p.229-243 |
---|---|
Main Authors: | , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | A method is described of obtaining fine-grain, non-columnar tungsten (W) by chemical vapor deposition (CVD). Typical CVD tungsten grows columnar grains perpendicular to a heated surface when deposited from its halides, generally WF or WCl
6. The present method involves the partial nitriding of the tungsten to W
2N. during deposition, and subsequent decomposition of the W
2N. The presence of this second phase (W
2N) alters the growth pattern of the depositing tungsten and eliminates columnar grain growth. |
---|---|
ISSN: | 0022-5088 |
DOI: | 10.1016/0022-5088(69)90161-1 |