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Fine-grain tungsten by chemical vapor deposition

A method is described of obtaining fine-grain, non-columnar tungsten (W) by chemical vapor deposition (CVD). Typical CVD tungsten grows columnar grains perpendicular to a heated surface when deposited from its halides, generally WF or WCl 6. The present method involves the partial nitriding of the t...

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Bibliographic Details
Published in:Journal of the less-common metals 1969-01, Vol.18 (3), p.229-243
Main Authors: Landingham, R.L., Austin, J.H.
Format: Article
Language:English
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Summary:A method is described of obtaining fine-grain, non-columnar tungsten (W) by chemical vapor deposition (CVD). Typical CVD tungsten grows columnar grains perpendicular to a heated surface when deposited from its halides, generally WF or WCl 6. The present method involves the partial nitriding of the tungsten to W 2N. during deposition, and subsequent decomposition of the W 2N. The presence of this second phase (W 2N) alters the growth pattern of the depositing tungsten and eliminates columnar grain growth.
ISSN:0022-5088
DOI:10.1016/0022-5088(69)90161-1