Measurement of the thickness of thin films deposited on smooth non-planar substrates

A simple Tolansky interferometer has been built under a low power microscope for measuring the thickness of thin films. A new procedure of evaluating the interferograms has been developed which is applicable whenever the substrate carrying the film is not plane but smoothly curved.

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Bibliographic Details
Published in:Optics and laser technology 1978-01, Vol.10 (1), p.37-39
Main Authors: Gustafsson, S.E., Ijaz-Ur-Rehman, Saleem Iqbal, M.
Format: Article
Language:English
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Summary:A simple Tolansky interferometer has been built under a low power microscope for measuring the thickness of thin films. A new procedure of evaluating the interferograms has been developed which is applicable whenever the substrate carrying the film is not plane but smoothly curved.
ISSN:0030-3992
1879-2545
DOI:10.1016/0030-3992(78)90029-4