Photodegradation of polystyrene in the presence of low molecular weight impurities containing chlorine

UV, EPR spectroscopy and gel permeation chromatography were used to study the type and transformation of radicals, the variation of MWD and kinetics of formation of carbonyl groups during UV radiation in polystyrene films prepared from various solvents. A correlation was established between the amou...

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Bibliographic Details
Published in:Polymer science USSR 1979, Vol.21 (3), p.731-740
Main Authors: Ivanchev, S.S., Korneva, T.D., Maksimov, V.L., Podosenova, N.G.
Format: Article
Language:English
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Summary:UV, EPR spectroscopy and gel permeation chromatography were used to study the type and transformation of radicals, the variation of MWD and kinetics of formation of carbonyl groups during UV radiation in polystyrene films prepared from various solvents. A correlation was established between the amount of radicals formed, carbonyl group concentration and the number of ruptures. It was found that residues of the solvent containing chlorine in the film undergo intensive decomposition to form radicals. It was shown experimentally that radical formation in the film takes place in two stages, the polymer matrix being the sensitizing agent in decomposition. A possible mechanism was proposed for photodegradation of polystyrene in the presence of low molecular weight impurities containing chlorine.
ISSN:0032-3950
1878-268X
DOI:10.1016/0032-3950(79)90302-2