Photoradiation-induced postpolymerization of a monomer in polymethyl methacrylate

It is shown that the residual monomer in PMMA is very efficiently bonded by its photoradiation-induced postpolymerization. The ionizing radiation dose absorbed by the polymer is ≈5 kGr and below, and the residual amount of monomer decreased to 0.25 weight %. The photoradiation-induced postpolymeriza...

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Bibliographic Details
Published in:Polymer science USSR 1990, Vol.32 (9), p.1796-1800
Main Authors: Khamidova, L.G., Zhdanov, G.S., Milinchuk, V.K.
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Physicochemistry of polymers
Polymerization
Polymers and radiations
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Summary:It is shown that the residual monomer in PMMA is very efficiently bonded by its photoradiation-induced postpolymerization. The ionizing radiation dose absorbed by the polymer is ≈5 kGr and below, and the residual amount of monomer decreased to 0.25 weight %. The photoradiation-induced postpolymerization of MMA is based on chain photoradical reactions with chains of lenght 10–130 at doses of 20–5 kGr respectively.
ISSN:0032-3950
1878-268X
DOI:10.1016/0032-3950(90)90288-H