Diffusion and structural relaxation in amorphous Mo/Si multilayers

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Bibliographic Details
Published in:Scripta metallurgica 1986-12, Vol.20 (12), p.1683-1687
Main Authors: Sloof, W.G., Loopstra, O.B., de Keijser, Th.H., Mittemeijer, E.J.
Format: Article
Language:English
Subjects:
Chemical interdiffusion
diffusion barriers
Condensed matter: structure, mechanical and thermal properties
Diffusion in solids
Exact sciences and technology
Physics
Transport properties of condensed matter (nonelectronic)
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ISSN:0036-9748
DOI:10.1016/0036-9748(86)90269-3