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Stationary room temperature MOS-C deep-depletion characteristics
A room temperature experimental technique which yields time-independent MOS-C C− V G deep depletion characteristics for both n- and p-bulk devices is described, explained and illustrated. The stationary deep depletion characteristics are obtained by making use of lateral charge transfer in a standar...
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Published in: | Solid-state electronics 1975, Vol.18 (1), p.79-85 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A room temperature experimental technique which yields time-independent MOS-C
C−
V
G
deep depletion characteristics for both
n- and
p-bulk devices is described, explained and illustrated. The stationary deep depletion characteristics are obtained by making use of lateral charge transfer in a standard ring-dot structure after having controllably charged the interelectrode ambient-oxide interface. Technique limitations associated with the magnitude of the interelectrode charge, surface states, and minority carrier dynamics are also illustrated experimentally and analyzed theoretically. |
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ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/0038-1101(75)90073-8 |