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Investigation of leakage characteristics of PbSnTes̵bndPbTe inverted heterostructure diodes
The results of a study of the overall electrical characteristics of PbSnTe diodes are presented and interpreted on the basis of a simple p- n junction model. These diodes are made from a PbSnTe epilayer grown by a liquid-phase epitaxy technique on a PbTe wafer substrate. The diodes have a 50% spectr...
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Published in: | Solid-state electronics 1978, Vol.21 (4), p.625-632 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The results of a study of the overall electrical characteristics of PbSnTe diodes are presented and interpreted on the basis of a simple
p-
n junction model. These diodes are made from a PbSnTe epilayer grown by a liquid-phase epitaxy technique on a PbTe wafer substrate. The diodes have a 50% spectral cutoff at 11.5 μm when operated at 85K, which shifts to 14.5 μm at
T = 15K. Major contributions to the bulk current are diffusion current at
T > 80K, and generation-recombination current for 80 >
T ≳ 30K. Surface related leakage is predominant at
T < 30 K for small area diodes (
A < 1 × 10
−4 cm
2) at low bias voltage. Bulk defect related leakage contributes heavily the large area diodes (
A > 1 × 10
−3 cm
2) at
T ≲ 60K. |
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ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/0038-1101(78)90328-3 |